Advanced high temperature superconductor film-based process using RABiTS | Zendy

A. Goyal | Zendy; R.A. Hawsey | Zendy; J. E. Hack | Zendy; Daeyoung Moon | Zendy

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Advanced high temperature superconductor film-based process using RABiTS

Author(s) -

A. Goyal,

R.A. Hawsey,

J. E. Hack,

Daeyoung Moon

Publication year - 2000

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/750964

Subject(s) - oak ridge national laboratory , metalorganic vapour phase epitaxy , superconductivity , deposition (geology) , chemical vapor deposition , high temperature superconductivity , materials science , process (computing) , high energy , process development , nuclear engineering , engineering physics , process engineering , nanotechnology , computer science , engineering , nuclear physics , physics , operating system , condensed matter physics , paleontology , epitaxy , layer (electronics) , sediment , biology

The purpose of this Cooperative Research and Development Agreement (CRADA) between Lockheed Martin Energy Research Corporation (Contractor), Managing contractor for Oak Ridge National Laboratory (ORNL) and Midwest Superconductivity, Inc. (MSI) and Westinghouse Science and Electric Company (WEC) was to develop the basis for a commercial process for the manufacturing of superconducting tape based on the RABiTS technology developed at ORNL. The chosen method for deposition of YBCO films on RABiTS was Metal Organic chemical Vapor Deposition (MOCVD)

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