Open AccessAuger-electron line-shape study of CVD silicon nitride films
Author(s) -
H. H. Madden,
George A. Moore,
Paul H. Holloway
Publication year - 1977
Language(s) - English
Resource type - Reports
DOI - 10.2172/7317054
Subject(s) - silicon nitride , nitride , oxygen , auger , auger electron spectroscopy , silicon , passivation , materials science , nitrogen , chemical vapor deposition , analytical chemistry (journal) , optoelectronics , chemistry , nanotechnology , atomic physics , layer (electronics) , physics , organic chemistry , chromatography , nuclear physics
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