Open AccessTest masks for the experimental evaluation of automated IC photomask inspection systems
Author(s) -
D. Ciarlo
Publication year - 1976
Language(s) - English
Resource type - Reports
DOI - 10.2172/7137632
Subject(s) - photomask , integrated circuit , computer science , fabrication , optical proximity correction , computer hardware , engineering drawing , artificial intelligence , materials science , engineering , photolithography , nanotechnology , resist , medicine , alternative medicine , layer (electronics) , pathology , operating system
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