Open AccessPotential applications of an electron cyclotron resonance multicusp plasma source
Author(s) -
C. C. Tsai,
L. A. Berry,
S. M. Gorbatkin,
H. H. Haselton,
J. B. Roberto,
D. E. Schechter,
W. L. Stirling
Publication year - 1990
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/7097370
Subject(s) - electron cyclotron resonance , plasmatron , plasma , atomic physics , argon , ion source , wafer , etching (microfabrication) , chemistry , materials science , analytical chemistry (journal) , physics , optoelectronics , nanotechnology , nuclear physics , layer (electronics) , chromatography
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