Open AccessThe effect of target thickness on x-ray production by FXR (Flash X-Ray Machine)
Author(s) -
N. L. Back
Publication year - 1986
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6986854
Subject(s) - bremsstrahlung , flux (metallurgy) , physics , electron , flash (photography) , beam (structure) , tantalum , range (aeronautics) , cathode ray , photon flux , photon , atomic physics , x ray , optics , nuclear physics , computational physics , materials science , metallurgy , composite material
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