Open AccessAn in-situ spectroscopic erosion yield measurement with applications to sputtering and surface morphology alterations
Author(s) -
W K Leung,
Y Hirooka,
R W Conn,
D M Goebel,
B LaBombard,
R Nygren
Publication year - 1988
Language(s) - English
Resource type - Reports
DOI - 10.2172/6933215
Subject(s) - erosion , plasma , sputtering , yield (engineering) , materials science , flux (metallurgy) , impurity , morphology (biology) , analytical chemistry (journal) , metallurgy , chemistry , geology , thin film , nanotechnology , physics , quantum mechanics , paleontology , organic chemistry , chromatography