An in-situ spectroscopic erosion yield measurement with applications to sputtering and surface morphology alterations
Author(s) -
W.K. Leung,
Y. Hirooka,
R.W. Conn,
Dan M. Goebel,
B. LaBombard,
R.E. Nygren
Publication year - 1988
Language(s) - English
Resource type - Reports
DOI - 10.2172/6933215
Subject(s) - erosion , plasma , sputtering , yield (engineering) , materials science , flux (metallurgy) , impurity , morphology (biology) , analytical chemistry (journal) , metallurgy , chemistry , geology , thin film , nanotechnology , physics , quantum mechanics , paleontology , organic chemistry , chromatography
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