Grain orientation mapping of passivated aluminum interconnect wires with X-ray micro-diffraction
Author(s) -
A.A. MacDowell,
H.A. Padmore,
A.C. Thompson,
C.H. Chang,
J.R. Patel
Publication year - 1998
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/677095
Subject(s) - diffraction , materials science , optics , monochromatic color , orientation (vector space) , context (archaeology) , interconnection , electron backscatter diffraction , x ray crystallography , optoelectronics , physics , geometry , computer science , paleontology , computer network , mathematics , biology
A micro x-ray diffraction facility is under development at the Advanced Light source. Spot sizes are typically about 1-{micro}m size generated by means of grazing incidence Kirkpatrick-Baez focusing mirrors. Photon energy is either white of energy range 6--14 keV or monochromatic generated from a pair of channel cut crystals. A Laue diffraction pattern from a single grain in passivated 2-{micro}m wide bamboo structured Aluminum interconnect line has been recorded. Acquisition times are of the order of a few seconds. The Laue pattern has allowed the determination of the crystallographic orientation of individual grains along the line length. The experimental and analysis procedures used are described, as is a grain orientation result. The future direction of this program is discussed in the context of strain measurements in the area of electromigration
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