Low-energy electron diffraction investigation of epitaxial growth: Pt and Pd on Pd(100)
Author(s) -
D.K. Flynn-Sanders
Publication year - 1990
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6767805
Subject(s) - epitaxy , low energy electron diffraction , diffusion , electron diffraction , diffraction , surface diffusion , analytical chemistry (journal) , crystallography , kinetic energy , chemistry , intensity (physics) , adsorption , phase (matter) , electron , materials science , scattering , layer (electronics) , nanotechnology , optics , thermodynamics , physics , organic chemistry , chromatography , quantum mechanics
We investigate the epitaxial growth of Pt and Pd and Pd(100) via spot profile analysis using conventional low-energy electron diffraction (LEED). We resolve a central-spike and diffuse component in the spot profiles, reflecting the layer-occupations and pair-correlations, respectively. Kinetic limitations inhibit layer-by-layer growth at low temperatures. Our data suggest diffusion switches on at ca. 150 K for Pt and ca. 170 K for Pd indicating activation barriers to surface diffusion of ca. 10 and ca. 13 kcal/mol, respectively. To clarify the role of diffusion in determining the resulting film morphology, we develop a growth model that incorporates the adsorption-site requirement and predicts intensity oscillations. We present a new procedure to experimentally determine out-of-phase scattering conditions. At these energies, ring-structure is evident in the profiles during Pd growth between ca. 200 and 400 K. We report ring intensity oscillations as a function of coverage, which demonstrate the filling of individual layers.
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