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Practical limitations to indentation testing of thin films
Author(s) -
J.A. Schneider,
Kevin F. McCarty,
Jason R. Heffelfinger,
N. R. Moody
Publication year - 1998
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/663560
Subject(s) - indentation , materials science , sapphire , thin film , indentation hardness , surface roughness , surface finish , nanoindentation , characterization (materials science) , composite material , atomic force microscopy , optics , nanotechnology , microstructure , laser , physics
A method that is becoming increasingly common for measuring the mechanical behavior of thin films is low-load indentation testing. However, there can be complications in interpreting the results as many factors can affect hardness and moduli measurements such as surface roughness and determination of the indentation contact area. To further the understanding, the mechanical properties of thin (50 nm) films of AlN on sapphire substrates were evaluated using a scanning force microscopy (SFM) based pico-indentation device to allow imaging of the surface and indentations. The primary emphasis was the types of problems or limitations involved in testing very thin, as deposited films in which properties are desired over indentation depths less than 50 nm

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