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Reaction studies of hot silicon and germanium radicals. Period covered: September 1, 1977--August 31, 1978
Author(s) -
Peter P. Gaspar
Publication year - 1978
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6509025
Subject(s) - silylene , silicon , germanium , radical , ionic bonding , period (music) , chemistry , ion , photochemistry , organic chemistry , physics , acoustics

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