Open AccessDevelopment of a polysilicon process based on chemical vapor deposition (Phase 1). Fifth quarterly progress report, 1 October-31 December 1980
Author(s) -
John R. McCormick,
Kenneth G. Sharp,
A. Arvidson,
D. Sawyer
Publication year - 1981
Language(s) - English
Resource type - Reports
DOI - 10.2172/6428678
Subject(s) - trichlorosilane , dichlorosilane , polycrystalline silicon , chemical vapor deposition , materials science , silicon , process engineering , hydrogen , chemical engineering , chemistry , nanotechnology , engineering , optoelectronics , organic chemistry , layer (electronics) , thin film transistor