Open AccessUhv-stem studies on nucleation and growth of thin metal silicide films on silicon
Author(s) -
J. Silcox,
E.J. Kirkland
Publication year - 1992
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/6207328
Subject(s) - nucleation , scanning transmission electron microscopy , silicon , materials science , silicide , transmission electron microscopy , scanning electron microscope , spectroscopy , grain boundary , metal , thin film , nanotechnology , metallurgy , crystallography , chemistry , physics , composite material , microstructure , organic chemistry , quantum mechanics
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