Open AccessIon diffusion at interfaces in hot plasmas
Author(s) -
David B. Boercker,
K.M. Warren,
G.L. Haggin
Publication year - 1986
Language(s) - English
Resource type - Reports
DOI - 10.2172/5877445
Subject(s) - diffusion , ion , ambipolar diffusion , plasma , binary number , ionic bonding , electric field , mixing (physics) , interface (matter) , work (physics) , ionization , materials science , chemical physics , atomic physics , statistical physics , mechanics , thermodynamics , chemistry , physics , mathematics , nuclear physics , arithmetic , organic chemistry , bubble , maximum bubble pressure method , quantum mechanics