Open AccessMultichannel euv spectroscopy of high temperature plasmas
Author(s) -
R. J. Fonck
Publication year - 1983
Language(s) - English
Resource type - Reports
DOI - 10.2172/5576379
Subject(s) - extreme ultraviolet lithography , tokamak , spectrometer , radiation , spectroscopy , plasma , extreme ultraviolet , photodiode , instrumentation (computer programming) , plasma diagnostics , impurity , optics , physics , ultraviolet , materials science , atomic physics , nuclear physics , computer science , laser , astronomy , quantum mechanics , operating system