z-logo
open-access-imgOpen Access
Threshold irradiation dose for amorphization of silicon carbide
Author(s) -
L. L. Snead,
S.J. Zinkle
Publication year - 1997
Language(s) - English
Resource type - Reports
DOI - 10.2172/543281
Subject(s) - irradiation , materials science , ion , silicon , silicon carbide , amorphous solid , xenon , analytical chemistry (journal) , atomic physics , crystallography , radiochemistry , nuclear physics , chemistry , optoelectronics , metallurgy , physics , organic chemistry , chromatography

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here