Open AccessOperating procedure for combined Auger - and ellipsometer uhv-system
Author(s) -
F. Schwager
Publication year - 1981
Language(s) - English
Resource type - Reports
DOI - 10.2172/5396328
Subject(s) - silicon , oxide , analytical chemistry (journal) , copper , auger electron spectroscopy , ellipsometry , hydrogen , materials science , torr , etching (microfabrication) , chemical vapor deposition , wet cleaning , chemistry , thin film , nanotechnology , optoelectronics , metallurgy , organic chemistry , physics , layer (electronics) , nuclear physics , thermodynamics