Open AccessStress relaxation and hillock growth in thin films
Author(s) -
M S Jackson,
C Y Li
Publication year - 1978
Language(s) - English
Resource type - Reports
DOI - 10.2172/5381280
Subject(s) - hillock , materials science , stress relaxation , nucleation , relaxation (psychology) , creep , isothermal process , plasticity , stress (linguistics) , atmospheric temperature range , thin film , thermodynamics , composite material , nanotechnology , linguistics , philosophy , psychology , social psychology , physics