Open AccessEffects of impurities on intrinsic stress in thin nickel films. Technical report No. 83. [Vapor deposition in uhv]
Author(s) -
Pierre Martin Alexander,
R. W. Hoffman
Publication year - 1975
Language(s) - English
Resource type - Reports
DOI - 10.2172/5128941
Subject(s) - impurity , nickel , chemical vapor deposition , materials science , thin film , deposition (geology) , stress (linguistics) , metallurgy , chemical engineering , chemistry , nanotechnology , organic chemistry , engineering , geology , paleontology , linguistics , philosophy , sediment
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