Open AccessMetrology of 13-nm optics for extreme ultraviolet lithography
Author(s) -
John F. Beckwith,
S. R. Patterson,
D.C. Thompson,
Vivek G. Badami,
Stephen P. Smith
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/507835
Subject(s) - metrology , lithography , extreme ultraviolet lithography , fabrication , scope (computer science) , interferometry , optics , computer science , key (lock) , materials science , systems engineering , nanotechnology , engineering , physics , medicine , alternative medicine , computer security , pathology , programming language
This report documents activities carried in support of the design and construction of an ultra-high precision measuring machine intended for the support of Extreme Ultraviolet Lithography development (for semiconductor fabrication). At the outset, this project was aimed at the overall fabrication of such a measuring machine. Shortly after initiation, however, the scope of activities was reduced and effort was concentrated on the key technical advances necessary to support such machine development: high accuracy surface sensing and highly linear distance interferometry
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