Production of multicomponent thin films by rf cosputtering
Author(s) -
B. F. T. Bolker
Publication year - 1975
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/5034669
Subject(s) - electron microprobe , electrical resistivity and conductivity , materials science , thin film , sputtering , microprobe , auger electron spectroscopy , analytical chemistry (journal) , auger , diffraction , volume (thermodynamics) , mineralogy , metallurgy , optics , nanotechnology , chemistry , physics , atomic physics , nuclear physics , chromatography , quantum mechanics
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