Open AccessUltrahigh spatial-frequency, high-contrast periodic structures produced by interference lithography
Author(s) -
H. T. Nguyen,
Jerald A. Britten,
Robert Boyd,
B. Shore,
M. Perry
Publication year - 1996
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/489588
Subject(s) - photoresist , lithography , interference lithography , duty cycle , materials science , common emitter , photolithography , etching (microfabrication) , optics , interference (communication) , x ray lithography , optoelectronics , spatial frequency , aspect ratio (aeronautics) , layer (electronics) , resist , nanotechnology , fabrication , physics , engineering , channel (broadcasting) , electrical engineering , medicine , alternative medicine , pathology , voltage
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