Installation of Multiple Application X-ray Imaging Undulator Microscope (MAXIMUM) at ALS: Final report, 8/15/95-8/15/96 | Zendy

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Installation of Multiple Application X-ray Imaging Undulator Microscope (MAXIMUM) at ALS: Final report, 8/15/95-8/15/96

Publication year - 1996

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/486588

Subject(s) - undulator , beamline , microscope , usable , x ray , optics , optical microscope , materials science , physics , analytical chemistry (journal) , laser , chemistry , scanning electron microscope , computer science , beam (structure) , chromatography , world wide web

MAXIMUM is short for Multiple Application X-ray IMaging Undulator Microscope, a project started in 1988 by our group at the Synchrotron Radiation Center of the University of Wisconsin-Madison. It is a scanning x-ray photoemission microscope that uses a multilayer-coated Schwarzschild objective as the focusing element. It was designed primarily for materials science studies of lateral variations in surface chemistry. Suitable problems include: lateral inhomogeneities in Schottky barrier formation, heterojunction formation, patterned samples and devices, insulating samples. Any system which has interesting properties that are not uniform as a function of spatial dimension can potentially be studied with MAXIMUM. 6 figs., 3 tabs

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