Alkaline etch system qualification
Author(s) -
S.E. Goldammer,
S.E. Pemberton,
Danita Tucker
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/481585
Subject(s) - etching (microfabrication) , printed circuit board , consistency (knowledge bases) , characterization (materials science) , embedded system , production (economics) , process (computing) , computer science , process engineering , engineering , materials science , nanotechnology , operating system , layer (electronics) , artificial intelligence , economics , macroeconomics
Based on the data from this qualification activity, the Atotech etch system, even with minimum characterization, was capable of etching production printed circuit products as good as those from the Chemcut system. Further characterization of the Atotech system will improve its etching capability. In addition to the improved etch quality expected from further characterization, the Atotech etch system has additional features that help reduce waste and provide for better consistency in the etching process. The programmable logic controller and computer will allow operators to operate the system manually or from pre-established recipes. The evidence and capabilities of the Atotech system made it as good as or better than the Chemcut system for etching WR products. The Printed Wiring Board Engineering Department recommended that the Atotech system be released for production. In December 1995, the Atotech system was formerly qualified for production
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