Materials and corrosion characterization using the confocal resonator
Author(s) -
C.P. Tigges,
N.R. Sorensen,
V.M. Hietala,
T.A. Plut
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/477763
Subject(s) - characterization (materials science) , materials science , corrosion , semiconductor device fabrication , resonator , semiconductor , nanotechnology , thin film , computer science , optoelectronics , metallurgy , wafer
Improved characterization and process control is important to many Sandia and DOE programs related to manufacturing. Many processes/structures are currently under-characterized including thin film growth, corrosion and semiconductor structures, such as implant profiles. A sensitive tool is required that is able to provide lateral and vertical imaging of the electromagnetic properties of a sample. The confocal resonator is able to characterize the surface and near-surface impedance of materials. This device may be applied to a broad range of applications including in situ evaluation of thin film processes, physical defect detection/characterization, the characterization of semiconductor devices and corrosion studies. In all of these cases, the technology should work as a real-time process diagnostic or as a feedback mechanism regarding the quality of a manufacturing process. This report summarizes the development and exploration of several diagnostic applications
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