Positive and negative chlorine ion kinetics in inductively-coupled Cl{sub 2}BCl{sub 3} plasmas | Zendy

C. B. Fleddermann | Zendy; G. A. Hebner | Zendy

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Positive and negative chlorine ion kinetics in inductively-coupled Cl{sub 2}BCl{sub 3} plasmas

Author(s) -

C. B. Fleddermann,

G. A. Hebner

Publication year - 1997

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/474927

Subject(s) - metastability , plasma , ion , inductively coupled plasma , chlorine , analytical chemistry (journal) , chemistry , etching (microfabrication) , inductively coupled plasma mass spectrometry , atomic physics , mass spectrometry , physics , nuclear physics , organic chemistry , chromatography , layer (electronics)

Discharges in gas mixtures of Cl{sub 2}, BCl{sub 3}, Ar, and N{sub 2} are used by the integrated circuit industry for metal etching, and are as yet not well understood, especially in inductively-coupled plasma (ICP) sources which are rapidly becoming the industry standard for etching tools. An essential parameter that must be measured in these plasmas is the density of ions, both positive and negative, formed in the plasma. In the work presented here, LIF and laser photodetachment were used to measure relative metastable chlorine ion CL{sup +}* density and temperature and absolute Cl{sup {minus}} density as a function of gas mixture

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