Ion energy distribution functions in inductively coupled RF discharges in mixtures of chlorine and boron trichloride | Zendy

J. R. Woodworth | Zendy; C. A. Nichols | Zendy; T. W. Hamilton | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Ion energy distribution functions in inductively coupled RF discharges in mixtures of chlorine and boron trichloride

Author(s) -

J. R. Woodworth,

C. A. Nichols,

T. W. Hamilton

Publication year - 1997

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/463640

Subject(s) - boron , boron trichloride , chlorine , inductively coupled plasma , ion , chemistry , plasma , analytical chemistry (journal) , inorganic chemistry , environmental chemistry , nuclear physics , physics , organic chemistry

Plasma discharges involving mixtures of chlorine and boron trichloride are widely used to etch metals in the production of very-large-scale-integrated circuits. Energetic ions play a critical role in this process, influencing the etch rates, etch profiles, and selectivity to different materials. The authors are using a gridded energy analyzer to measure positive ion energy distributions and fluxes at the grounded electrode of high-density inductively-coupled rf discharges. In this paper, they present details of ion energies and fluxes in discharges containing mixtures of chlorine and boron trichloride

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research