Open AccessRATE OF GROWTH OF DIFFUSION LAYERS IN U-Al AND U-AlSi COUPLES
Author(s) -
L S DeLuca,
H. T. Sumsion
Publication year - 1957
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/4343678
Subject(s) - eutectic system , diffusion , materials science , alloy , metallurgy , layer (electronics) , atmospheric temperature range , analytical chemistry (journal) , range (aeronautics) , growth rate , composite material , thermodynamics , chemistry , physics , chromatography , geometry , mathematics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom