Magnetically controlled deposition of metals using gas plasma. Quarterly progress report, July--September 1996 | Zendy

D. M. Woodall | Zendy; E.C. Lemmon | Zendy

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Magnetically controlled deposition of metals using gas plasma. Quarterly progress report, July--September 1996

Author(s) -

D. M. Woodall,

E.C. Lemmon

Publication year - 1996

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/418387

Subject(s) - plasma , deposition (geology) , finite element method , substrate (aquarium) , magnetic field , flow (mathematics) , plating (geology) , process (computing) , materials science , mechanics , mechanical engineering , metallurgy , analytical chemistry (journal) , nuclear engineering , chemistry , thermodynamics , engineering , physics , environmental chemistry , computer science , geology , nuclear physics , paleontology , oceanography , quantum mechanics , sediment , geophysics , operating system

Objective is to develop a method of spraying materials on a substrate in a controlled manner to eliminate the waste inherent in present plating processes. The process under investigation is magnetically controlled plasma spraying. The field equations have been cast in a format that allows finite element solution. Potential flow and finite element solutions for temperature isolines and velocity vectors are compared for 2-D flow with heat addition

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