High current short pulse ion sources | Zendy

K. N. Leung | Zendy

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High current short pulse ion sources

Author(s) -

K. N. Leung

Publication year - 1996

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/414414

Subject(s) - plasma , cathode , materials science , ion current , beam (structure) , aperture (computer memory) , current (fluid) , pulse (music) , voltage , ion source , ion beam , ion , electric arc , optoelectronics , laser , plasma channel , optics , chemistry , electrical engineering , physics , electrode , organic chemistry , quantum mechanics , acoustics , engineering

High current short pulse ion beams can be generated by using a multicusp source. This is accomplished by switching the arc or the RF induction discharge on and off. An alternative approach is to maintain a continuous plasma discharge and extraction voltage but control the plasma flow into the extraction aperture by a combination of magnetic and electric fields. Short beam pulses can be obtained by using a fast electronic switch and a dc bias power supply. It is also demonstrated that very short beam pulses ({approximately} 10 {micro}s) with high repetition rate can be formed by a laser-driven LaB{sub 6} or barium photo-cathode

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