Precision optical aspheres for extreme ultraviolet lithography | Zendy

D. Kania | Zendy; D. P. Gaines | Zendy; D.S. Sweeney | Zendy; Gary E. Sommargren | Zendy; Bruno La Fontaine | Zendy; S. P. Ver | Zendy; D.A. Tichnor | Zendy; J. E. Bjorkholm | Zendy; F. Zernike | Zendy; Robert Kestner | Zendy

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Precision optical aspheres for extreme ultraviolet lithography

Author(s) -

D. Kania,

D. P. Gaines,

D.S. Sweeney,

Gary E. Sommargren,

Bruno La Fontaine,

S. P. Ver,

D.A. Tichnor,

J. E. Bjorkholm,

F. Zernike,

Robert Kestner

Publication year - 1996

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/281722

Subject(s) - extreme ultraviolet lithography , lithography , extreme ultraviolet , optics , diffraction , ultraviolet , materials science , photolithography , throughput , optoelectronics , x ray lithography , physics , resist , computer science , nanotechnology , telecommunications , laser , layer (electronics) , wireless

We have demonstrated significant advances in the production of aspheric optics for extreme ultraviolet lithography. An optic has been fabricated with an aspheric departure of 1.5 {mu}m, a figure error of 0.7 nm rms and a nanoroughness of 0.25 nm rms. Further improvements are required in the figure and nanoroughness to reach high throughput and near diffraction limited performance in an EUVL system. 8 refs., 2 figs

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