Open AccessECR etching of GaP, GaAs, InP, and InGaAs in Cl{sub 2}/Ar, Cl{sub 2}/N{sub 2}, BCl{sub 3}/Ar, and BCl{sub 3}/N{sub 2}
Author(s) -
R. J. Shul,
Albert G. Baca,
D. J. Rieger,
HungChing Hou,
S.J. Pearton,
F. Ren
Publication year - 1996
Language(s) - English
Resource type - Reports
DOI - 10.2172/244631
Subject(s) - analytical chemistry (journal) , chemistry , electron cyclotron resonance , etching (microfabrication) , plasma , band gap , reactive ion etching , chlorine , ion , materials science , optoelectronics , physics , organic chemistry , chromatography , layer (electronics) , quantum mechanics
Electron cyclotron resonance (ECR) etching GaP, GaAs, InP, and InGaAs are reported as a function of percent chlorine-containing gas for Cl{sub 2}/Ar, Cl{sub 2}/N{sub 2}, BCl{sub 3}/Ar, and BCl{sub 3}N{sub 2} plasma chemistries. GaAs and GaP etch rates were faster than InP and InGaAs, independent of plasma chemistry due to the low volatility of the InCl{sub x} etch products. GaAs and GaP etch rates increased as %Cl{sub 2} was increased for Cl{sub 2}/Ar and Cl{sub 2}/N{sub 2} plasmas. The GaAs and GaP etch rates were much slower in BCl{sub 3}-based plasmas due to lower concentrations of reactive Cl, however enhanced etch rates were observed in BCl{sub 3}/N{sub 2} at 75% BCl{sub 3}. Smooth etched surfaces were obtained over a wide range of plasma chemistries