Open AccessHigh-efficiency transmission gratings fabricated in bulk fused silica
Author(s) -
Hoa Thi Nguyen,
B. Shore,
Jerald A. Britten,
Steve Bryan,
S. Falabella,
Robert Boyd,
; Perry
Publication year - 1996
Language(s) - English
Resource type - Reports
DOI - 10.2172/231695
Subject(s) - materials science , photoresist , diffraction efficiency , fabrication , interference lithography , diffraction grating , optics , lithography , etching (microfabrication) , optoelectronics , transmission (telecommunications) , diffraction , photolithography , ultraviolet , grating , laser , nanotechnology , physics , computer science , medicine , alternative medicine , layer (electronics) , pathology , telecommunications
The authors present the design and performance of high-efficiency transmission gratings fabricated in bulk fused silica for use in ultraviolet high-power laser systems. The gratings exhibit a diffraction efficiency exceeding 95% in the m = {minus}1 order and damage threshold greater than 13 J/cm{sup 2} for 1 nsec pulses at 351 nm. Model calculations and experimental measurements are in good agreement. They describe the design and fabrication of these gratings based on the transfer ion etching of photoresist patterns produced by interference lithography