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Defect formation and carrier doping in epitaxial films of the infinite layer compound
Author(s) -
R. M. Feenstra,
S.J. Pennycook,
Matthew F. Chisholm
Publication year - 1996
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/219355
Subject(s) - doping , epitaxy , scanning tunneling microscope , materials science , annealing (glass) , molecular beam epitaxy , transmission electron microscopy , oxidizing agent , crystallography , scanning electron microscope , layer (electronics) , analytical chemistry (journal) , optoelectronics , chemistry , nanotechnology , organic chemistry , composite material
The correlation between defect formation and carrier doping in epitaxial films of the infinite layer compound SrCuO{sub 2} has been studied via molecular beam epitaxy controlled layer-by-layer growth experiments, chemically resolved scanning transmission electron microscopy, scanning tunneling microscopy, x-ray diffraction, electrical transport measurements, and post-growth oxidation-reduction annealing. Based on the complementary information provided by these experiments, it is concluded that the carrier doping is dominated by the formation of an electron-doped, Sr and O deficient matrix under mildly oxidizing growth conditions. Hole-doping is induced by extended defects containing excess Sr atoms and may lead to superconductivity after high-temperature oxidation

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