X-ray reflectivity study of gold films during sputter-deposition

We performed in-situ x-ray reflectivity measurements of gold films during sputter-deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the x-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the x-ray reflectivity data. The measured interface width during growth follows a simple power-law behavior consistent with recently developed dynamic scaling behavior. The scaling components, however, do not agree well with predictions based on some models in 2 + 1 dimensions