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A model of the gas-phase chemistry of boron nitride CVC from BCl{sub 3} and NH{sub 3}
Author(s) -
M.D. Allendorf,
Carl F. Melius,
Thomas H. Osterheld
Publication year - 1995
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/176802
Subject(s) - boron nitride , decomposition , gas phase , chemical vapor deposition , nitrogen , boron , chemistry , nitride , deposition (geology) , kinetics , phase (matter) , elementary reaction , reaction mechanism , inorganic chemistry , analytical chemistry (journal) , environmental chemistry , organic chemistry , physics , catalysis , layer (electronics) , quantum mechanics , paleontology , sediment , biology
The kinetics of gas-phase reactions occurring during the CVD of boron nitride (BN) from BCl{sub 3} and NH{sub 3} are investigated using an elementary reaction mechanism whose rate constants were obtained from theoretical predictions and literature sources. Plug-flow calculations using this mechanism predict that unimolecular decomposition of BCl{sub 3} is not significant under typical CVD conditions, but that some NH{sub 3} decomposition may occur, especially for deposition occurring at atmospheric pressure. Reaction of BCl{sub 3} with NH{sub 3} is rapid under CVD conditions and yields species containing both boron and nitrogen. One of these compounds, Cl{sub 2}BNH{sub 2}, is predicted to be a key gas-phase precursor to BN

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