A model of the gas-phase chemistry of boron nitride CVC from BCl{sub 3} and NH{sub 3}
Author(s) -
M.D. Allendorf,
Carl F. Melius,
Thomas H. Osterheld
Publication year - 1995
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/176802
Subject(s) - boron nitride , decomposition , gas phase , chemical vapor deposition , nitrogen , boron , chemistry , nitride , deposition (geology) , kinetics , phase (matter) , elementary reaction , reaction mechanism , inorganic chemistry , analytical chemistry (journal) , environmental chemistry , organic chemistry , physics , catalysis , layer (electronics) , quantum mechanics , paleontology , sediment , biology
The kinetics of gas-phase reactions occurring during the CVD of boron nitride (BN) from BCl{sub 3} and NH{sub 3} are investigated using an elementary reaction mechanism whose rate constants were obtained from theoretical predictions and literature sources. Plug-flow calculations using this mechanism predict that unimolecular decomposition of BCl{sub 3} is not significant under typical CVD conditions, but that some NH{sub 3} decomposition may occur, especially for deposition occurring at atmospheric pressure. Reaction of BCl{sub 3} with NH{sub 3} is rapid under CVD conditions and yields species containing both boron and nitrogen. One of these compounds, Cl{sub 2}BNH{sub 2}, is predicted to be a key gas-phase precursor to BN
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom