Open AccessDevelopment of Thin Film Silicon Solar Cell Using Inkjet Printed Silicon and Other Inkjet Processes: Cooperative Research and Development Final Report, CRADA Number CRD-07-260
Author(s) -
Bhushan Sopori
Publication year - 2012
Language(s) - English
Resource type - Reports
DOI - 10.2172/1043746
Subject(s) - materials science , silicon , substrate (aquarium) , amorphous silicon , photovoltaics , evaporation , layer (electronics) , thin film , chemical vapor deposition , solar cell , amorphous solid , sputtering , nanotechnology , optoelectronics , chemical engineering , crystalline silicon , photovoltaic system , chemistry , electrical engineering , engineering , oceanography , physics , organic chemistry , thermodynamics , geology
The cost of silicon photovoltaics (Si-PV) can be greatly lowered by developing thin-film crystalline Si solar cells on glass or an equally lower cost substrate. Typically, Si film is deposited by thermal evaporation, plasma enhanced chemical vapor deposition, and sputtering. NREL and Silexos have worked under a CRADA to develop technology to make very low cost solar cells using liquid organic precursors. Typically, cyclopentasilane (CPS) is deposited on a glass substrate and then converted into an a-Si film by UV polymerization followed by low-temperature optical process that crystallizes the amorphous layer. This technique promises to be a very low cost approach for making a Si film