Open AccessFinal technical report for {open_quotes}application of IRIS to semiconductor plasma processing{close_quotes} (CRADA No. 1031)
Author(s) -
Po-Ching Ho,
Kevin Killeen,
Carl F. Melius,
Richard J. Buss
Publication year - 1994
Language(s) - English
Resource type - Reports
DOI - 10.2172/10196412
Subject(s) - flexural strength , annealing (glass) , materials science , fracture toughness , commercialization , plasma , crystallization , silicon nitride , microwave , semiconductor , silicon , composite material , metallurgy , optoelectronics , computer science , engineering , chemical engineering , telecommunications , physics , business , quantum mechanics , marketing
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