Open AccessA theoretical study of 30 to 50 angstrom noble gas heavy ion lithography
Author(s) -
Carole Nelson,
H. Makowitz
Publication year - 1994
Language(s) - English
Resource type - Reports
DOI - 10.2172/10167534
Subject(s) - krypton , noble gas , neon , xenon , angstrom , argon , silicon , etching (microfabrication) , ion , materials science , substrate (aquarium) , layer (electronics) , atomic physics , chemistry , nanotechnology , optoelectronics , crystallography , physics , organic chemistry , oceanography , geology
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