Open AccessPlasma-etching science meets technology in the MDL
Author(s) -
K. E. Greenberg,
Paul Miller,
R. Patteson,
Bradley K. Smith
Publication year - 1993
Language(s) - English
Resource type - Reports
DOI - 10.2172/10147051
Subject(s) - reproducibility , plasma , reliability (semiconductor) , etching (microfabrication) , plasma etching , rectification , materials science , optoelectronics , nuclear engineering , analytical chemistry (journal) , engineering , chemistry , nanotechnology , electrical engineering , physics , nuclear physics , chromatography , power (physics) , quantum mechanics , layer (electronics) , voltage