Open AccessNon-alloyed, refractory metal contact optimization with shallow implantations of Zn and Mg
Author(s) -
M. L. Lovejoy,
J.C. Zolper,
M.E. Sherwin,
Albert G. Baca,
R. J. Shul,
D. J. Rieger,
J. F. Klem
Publication year - 1994
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/10144445
Subject(s) - contact resistance , ohmic contact , refractory metals , tungsten , materials science , ion implantation , sheet resistance , metal , fabrication , metallurgy , electrical resistivity and conductivity , ion , analytical chemistry (journal) , composite material , chemistry , electrical engineering , medicine , alternative medicine , organic chemistry , layer (electronics) , pathology , chromatography , engineering
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