Development of a laboratory extreme-ultraviolet lithography tool | Zendy

Daniel A. Tichenor | Zendy; Glenn D. Kubiak | Zendy; Marcin Malinowski | Zendy; R. H. Stulen | Zendy; Steven J. Haney | Zendy; Kurt W. Berger | Zendy; Rodney P. Nissen | Zendy; G. A. Wilkerson | Zendy; Phillip H. Paul | Zendy; Sal Birtola | Zendy; P. S. Jin | Zendy; R.W. Arling | Zendy; A. K. Raychaudhuri | Zendy; W.C. Sweatt | Zendy; ChiWai Chow | Zendy; J. E. Bjorkholm | Zendy; R. R. Freeman | Zendy; Marc D. Himel | Zendy; A.A. MacDowell | Zendy; D. M. Tennant | Zendy; Linus A. Fetter | Zendy; O. R. Wood | Zendy; W. K. Waskiewicz | Zendy; D.L. White | Zendy; D. L. Windt | Zendy; T. E. Jewell | Zendy

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Development of a laboratory extreme-ultraviolet lithography tool

Author(s) -

Daniel A. Tichenor,

Glenn D. Kubiak,

Marcin Malinowski,

R. H. Stulen,

Steven J. Haney,

Kurt W. Berger,

Rodney P. Nissen,

G. A. Wilkerson,

Phillip H. Paul,

Sal Birtola,

P. S. Jin,

R.W. Arling,

A. K. Raychaudhuri,

W.C. Sweatt,

ChiWai Chow,

J. E. Bjorkholm,

R. R. Freeman,

Marc D. Himel,

A.A. MacDowell,

D. M. Tennant,

Linus A. Fetter,

O. R. Wood,

W. K. Waskiewicz,

D.L. White,

D. L. Windt,

T. E. Jewell

Publication year - 1994

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/10136180

Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , optics , lithography , wafer , reflection (computer programming) , interferometry , metrology , laser , photolithography , physics , materials science , optoelectronics , computer science , programming language

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