Open AccessChemical vapor deposition of metal nitrides, phosphides and arsenides. Final report
Author(s) -
David M. Hoffman
Publication year - 1994
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/10132455
Subject(s) - yield (engineering) , chemical vapor deposition , chemistry , nitride , metal , inorganic chemistry , transition metal , silicon , silicon nitride , oxide , thin film , substrate (aquarium) , crystallography , materials science , nanotechnology , organic chemistry , layer (electronics) , catalysis , metallurgy , oceanography , geology
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