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Numerical methods for determining interstitial oxygen in silicon
Author(s) -
Joel O. Stevenson,
J.W. Medernach
Publication year - 1995
Language(s) - English
Resource type - Reports
DOI - 10.2172/10123297
Subject(s) - silicon , dopant , materials science , doping , electrical resistivity and conductivity , precipitation , fabrication , fourier transform infrared spectroscopy , oxygen , analytical chemistry (journal) , confusion , integrated circuit , electronic engineering , optoelectronics , electrical engineering , chemistry , physics , optics , engineering , medicine , psychology , alternative medicine , organic chemistry , pathology , chromatography , meteorology , psychoanalysis