Open AccessDirect measurement of the reactivity of NH and OH on a silicon nitride surface
Author(s) -
Richard J. Buss,
P Shing Ho,
W.G. Breiland,
Ellen R. Fisher
Publication year - 1993
Language(s) - English
Resource type - Reports
DOI - 10.2172/10116274
Subject(s) - reactivity (psychology) , silicon nitride , radical , nitride , silicon , substrate (aquarium) , analytical chemistry (journal) , plasma , chemistry , atmospheric temperature range , materials science , inorganic chemistry , nanotechnology , layer (electronics) , organic chemistry , medicine , alternative medicine , pathology , oceanography , physics , quantum mechanics , geology , meteorology
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