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Fullerenes as precursors for diamond film growth without hydrogen or oxygen additions
Author(s) -
D.M. Gruen,
S. Liu,
A. Krauß,
Jun Luo,
Xiao-Dan Pan
Publication year - 1993
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/10111257
Subject(s) - diamond , hydrogen , fullerene , oxygen , argon , materials science , thin film , material properties of diamond , chemical engineering , nanotechnology , chemistry , metallurgy , organic chemistry , engineering

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