Open AccessHigh-Sensitivity Total Reflection X-Ray Fluorescence Spectroscopy of Silicon Wafers Using Synchrotron Radiation
Author(s) -
S. S. Laderman,
A. FischerColbrie,
Ayako Shimazaki,
Kunihiro Miyazaki,
S. Brennan,
Noritaka Takakura,
P. Pianetta,
Jeffrey B. Kortright
Publication year - 1995
Publication title -
analytical sciences
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.392
H-Index - 73
eISSN - 1348-2246
pISSN - 0910-6340
DOI - 10.2116/analsci.11.515
Subject(s) - chemistry , synchrotron radiation , x ray fluorescence , synchrotron , wafer , silicon , total internal reflection , fluorescence , fluorescence spectroscopy , spectroscopy , analytical chemistry (journal) , synchrotron radiation source , reflection (computer programming) , optics , optoelectronics , materials science , physics , organic chemistry , chromatography , quantum mechanics , computer science , programming language