Open AccessA Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometryt
Author(s) -
Yoshihiro Mori,
Kengo Shimanoe,
Tadashi Sakon
Publication year - 1995
Publication title -
analytical sciences
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.392
H-Index - 73
eISSN - 1348-2246
pISSN - 0910-6340
DOI - 10.2116/analsci.11.499
Subject(s) - wafer , chemistry , x ray fluorescence , analytical chemistry (journal) , calibration , hydrogen peroxide , silicon , total internal reflection , reproducibility , homogeneity (statistics) , sample preparation , standard addition , impurity , contamination , fluorescence , detection limit , materials science , chromatography , optics , nanotechnology , optoelectronics , physics , organic chemistry , ecology , statistics , mathematics , biology