Femtosecond Pulsed Laser Deposition of Graphite on Silicon and Copper Foil | Zendy

Mary Ann Calleja | Zendy; Annaliza Amo | Zendy; Jessa Jayne Miranda | Zendy; Floyd Willis I. Patricio | Zendy; Wilson Garcia | Zendy

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Femtosecond Pulsed Laser Deposition of Graphite on Silicon and Copper Foil

Author(s) -

Mary Ann Calleja,

Annaliza Amo,

Jessa Jayne Miranda,

Floyd Willis I. Patricio,

Wilson Garcia

Publication year - 2014

Publication title -

journal of advanced computational intelligence and intelligent informatics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.172

H-Index - 20

eISSN - 1343-0130

pISSN - 1883-8014

DOI - 10.20965/jaciii.2014.p0764

Subject(s) - materials science , copper , femtosecond , silicon , graphite , pulsed laser deposition , foil method , deposition (geology) , substrate (aquarium) , laser , analytical chemistry (journal) , thin film , nanotechnology , optoelectronics , metallurgy , composite material , optics , chemistry , paleontology , oceanography , physics , chromatography , sediment , geology , biology

We deposited graphite on silicon (111) and copper foil substrate through femtosecond pulsed laser deposition (fs-PLD). A high purity graphite target was placed inside a vacuum chamber at a base pressure of 10 -2 mbar. The deposition time was varied for 3 hours, 4 hours and 5 hours. XRD spectra showed a (110) peak indicating an oriented growth for samples deposited on silicon (111) and copper foil substrates. AFM topographical images of the samples deposited on silicon (111) showed flake-like structures. However, samples deposited on copper foil showed the presence of defects and lack of deposited particles.

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