Formation and characterization of Amorphous Silicon (a-Si) and Aluminum (Al) thin films for the development of Spacer Lithography Technique | Zendy

Laís Oliveira de Souza | Zendy; J. A. Diniz | Zendy; Andressa Macedo Rosa | Zendy

Open Access

Formation and characterization of Amorphous Silicon (a-Si) and Aluminum (Al) thin films for the development of Spacer Lithography Technique

Author(s) -

Laís Oliveira de Souza,

J. A. Diniz,

Andressa Macedo Rosa

Publication year - 2016

Publication title -

anais do congresso de iniciação científica da unicamp

Language(s) - English

Resource type - Conference proceedings

ISSN - 2447-5114

DOI - 10.19146/pibic-2016-51668

Subject(s) - materials science , characterization (materials science) , lithography , silicon , aluminium , amorphous solid , amorphous silicon , nanotechnology , thin film , nanolithography , optoelectronics , metallurgy , fabrication , crystalline silicon , crystallography , chemistry , medicine , alternative medicine , pathology

This work presents the formation and characterization of Al thin films obtained by three different methods of deposition (DC magnetron sputtering, e-beam evaporation and thermal evaporation) and a-Si thin films deposited by ECR-CVD

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