Open AccessModelling and optimization of the technology process by ion beam etching
Author(s) -
А.А. Гурченков,
Л.А. Муравей,
А.М. Романенков
Publication year - 2014
Publication title -
inženernyj žurnal: nauka i innovacii
Language(s) - English
Resource type - Journals
ISSN - 2308-6033
DOI - 10.18698/2308-6033-2014-2-1211
Subject(s) - etching (microfabrication) , process (computing) , ion beam , materials science , ion , engineering physics , beam (structure) , computer science , process engineering , nanotechnology , engineering , optics , physics , operating system , layer (electronics) , quantum mechanics